Search results for "Plasma etching"
showing 6 items of 6 documents
Plasma Etching and Integration with Nanoprocessing
2009
This chapter introduces plasma etching—an extensive and perhaps the most widely used micro- and nanoprocessing method both in industry and in research and development laboratories worldwide. The emphasis is on the practical methods in plasma etching and reactive ion etching when used for submicron and nanoscale device fabrication. The principles of plasma etching and reactive ion etching equipment for sample fabrication will be introduced.
Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
2012
The plasma etch characteristics of aluminum nitride (AlN) deposited by low-temperature, 200 °C, plasma enhanced atomic layer deposition (PEALD) was investigated for reactive ion etch (RIE) and inductively coupled plasma-reactive ion etch (ICP-RIE) systems using various mixtures of SF6 and O2 under different etch conditions. During RIE, the film exhibits good mask properties with etch rates below 10r nm/min. For ICP-RIE processes, the film exhibits exceptionally low etch rates in the subnanometer region with lower platen power. The AlN film’s removal occurred through physical mechanisms; consequently, rf power and chamber pressure were the most significant parameters in PEALD AlN film remova…
Large area strip edgeless detectors fabricated by plasma etching process
2007
This work presents the last results from large area edgeless detector, fabricated by Plasma Etching Process to reduce the conventional width of the terminating structure of position sensitive detectors to the detector rim.. A current terminating ring is used to decouple the electrical behavior of the surface from the sensitive volume within a few tens of micrometers. The detectors have been illuminated using an infrared laser and their surface scanned in order to understand their collection behavior at the cut edge. The detectors have very high efficiency up to the insensitive area which is located about 60 mum from the detector edge.
Surface structure determination by SEM image processing and electrochemical impedance of graphite+polyethylene composite electrodes
2004
Abstract The electrochemical impedance behaviour of heterogeneous or/and rough electrodes has usually been associated with some geometrical parameters of the surface structure or to a statistical description of the surface properties. An experimental method for sample preparation of graphite + polyethylene composite electrodes based on plasma etching is proposed. After plasma etching, the statistical properties of the electrode, such as the graphite particle size distribution and fractional coverage are measured from scanning electron microscopy pictures using image processing software. The statistical information obtained for the surface is combined with impedance equations of independent …
Plasma Functionalization of Multiwalled Carbon Nanotubes and Their Use in the Preparation of Nylon 6-Based Nanohybrids
2012
The possibility to obtain carbon nanotubes (CNT)/polyamide 6 composites with excellent mechanical properties in a simple, industrially scalable way is investigated. Commercial CNTs are treated by plasma while changing some key parameters (exposure time, plasma power, type of gas) in order to optimize the process and to achieve a sufficient degree of functionalization. The treated samples are characterized by Fourier transform infrared spectroscopy, Raman spectroscopy and X-ray photoelectron spectroscopy. The most interesting samples are selected to be used as reinforcing fillers, in different concentrations, in a polyamide 6 matrix. The mechanical tests show a dramatic increase of both tens…
Plasma Functionalization of Multiwalled Carbon Nanotubes and Their Use in the Preparation of Nylon 6-Based Nanohybrids
2012
The possibility to obtain carbon nanotubes (CNT)/polyamide 6 composites with excellent mechanical properties in a simple, industrially scalable way is investigated. Commercial CNTs are treated by plasma while changing some key parameters (exposure time, plasma power, type of gas) in order to optimize the process and to achieve a sufficient degree of functionalization. The treated samples are characterized by Fourier transform infrared spectroscopy, Raman spectroscopy and X-ray photoelectron spectroscopy. The most interesting samples are selected to be used as reinforcing fillers, in different concentrations, in a polyamide 6 matrix. The mechanical tests show a dramatic increase of both tens…